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P/N | SDH-13304-HP-4 |
Power Supply | 3.0V |
Display Type | HTN, POSITIVE ,TRANSFLECTIVE |
Viewing Direction | 12.00 O’clock |
LCD Driving Method | 1/4 Duty, 1/3 Bias, 3.0V |
Driver IC | ST7565R |
Input Data | Parallel 6800 Series MPU Interface / Parallel 8080 Series MPU Interface / Serial 4-Line SPI Interface |
Module Size(W*H*T) | 170*57.6mm |
GLASS THICKNESS | 1.1 |
CONNECTOR | PIN |
Application：
BIGBOOK Factory：
Why choose Us：
**********************************************************************************************************************
Introducing our TFT LCD Display, designed specifically for use in smartwatches. With its high-definition picture quality, this display is sure to enhance the user experience.
Our product offers an affordable price point without sacrificing quality. Trust in our professional-grade technology to deliver clear and vibrant visuals, making it the perfect addition to any smartwatch. Invest in our TFT LCD Display and elevate your product to the next level.
TFT-LCD LCD technology:
The manufacturing process of thin film transistor liquid crystal display has the following parts: TFT array is formed on the TFT substrate; forming a color filter pattern and ITO conductive layer on the color filter substrate; with two substrates to form a liquid crystal box installation; peripheral circuit, backlight module assembly assembly.
1. process for forming TFT array on TFT substrate
TFT has realized the industrialization of the types include: amorphous silicon TFT (a-Si TFT), polycrystalline silicon TFT (p-Si TFT), monocrystalline silicon TFT (c-Si) several. Currently the most widely used is a-Si TFT.
The fabrication process of a-Si TFT is to first sputter the gate material film on the borosilicate glass substrate, and then form the grid pattern after the mask exposure, the development and the dry etching. Step exposure machine for general mask exposure. The second step is to use PECVD method for continuous film formation, SiNx film, non doped a-Si film, phosphorus doped n+a-Si film. Then, the a-Si pattern of the TFT part is formed by mask exposure and dry etching. The third step is to form a transparent electrode (ITO film) by sputtering, and then to display the electrode pattern by mask exposure and wet etching. The contact hole pattern of the fourth step gate extreme insulation film is formed by mask exposure and dry etching method. The fifth step is to sputter AL into the film, with mask exposure, etching the source, drain and signal line pattern of TFT. Finally, the protective film is formed by PECVD method, and then the film is etched by mask exposure and dry etching. The protective film is used to protect the electrode and the electrode and the display electrode. So far, the whole process is completed.
TFT array technology is the key of TFT-LCD manufacturing process, and the most part of equipment investment. The entire process requires a high level of purification (e.g., level 10).
P/N | SDH-13304-HP-4 |
Power Supply | 3.0V |
Display Type | HTN, POSITIVE ,TRANSFLECTIVE |
Viewing Direction | 12.00 O’clock |
LCD Driving Method | 1/4 Duty, 1/3 Bias, 3.0V |
Driver IC | ST7565R |
Input Data | Parallel 6800 Series MPU Interface / Parallel 8080 Series MPU Interface / Serial 4-Line SPI Interface |
Module Size(W*H*T) | 170*57.6mm |
GLASS THICKNESS | 1.1 |
CONNECTOR | PIN |
Application：
BIGBOOK Factory：
Why choose Us：
**********************************************************************************************************************
Introducing our TFT LCD Display, designed specifically for use in smartwatches. With its high-definition picture quality, this display is sure to enhance the user experience.
Our product offers an affordable price point without sacrificing quality. Trust in our professional-grade technology to deliver clear and vibrant visuals, making it the perfect addition to any smartwatch. Invest in our TFT LCD Display and elevate your product to the next level.
TFT-LCD LCD technology:
The manufacturing process of thin film transistor liquid crystal display has the following parts: TFT array is formed on the TFT substrate; forming a color filter pattern and ITO conductive layer on the color filter substrate; with two substrates to form a liquid crystal box installation; peripheral circuit, backlight module assembly assembly.
1. process for forming TFT array on TFT substrate
TFT has realized the industrialization of the types include: amorphous silicon TFT (a-Si TFT), polycrystalline silicon TFT (p-Si TFT), monocrystalline silicon TFT (c-Si) several. Currently the most widely used is a-Si TFT.
The fabrication process of a-Si TFT is to first sputter the gate material film on the borosilicate glass substrate, and then form the grid pattern after the mask exposure, the development and the dry etching. Step exposure machine for general mask exposure. The second step is to use PECVD method for continuous film formation, SiNx film, non doped a-Si film, phosphorus doped n+a-Si film. Then, the a-Si pattern of the TFT part is formed by mask exposure and dry etching. The third step is to form a transparent electrode (ITO film) by sputtering, and then to display the electrode pattern by mask exposure and wet etching. The contact hole pattern of the fourth step gate extreme insulation film is formed by mask exposure and dry etching method. The fifth step is to sputter AL into the film, with mask exposure, etching the source, drain and signal line pattern of TFT. Finally, the protective film is formed by PECVD method, and then the film is etched by mask exposure and dry etching. The protective film is used to protect the electrode and the electrode and the display electrode. So far, the whole process is completed.
TFT array technology is the key of TFT-LCD manufacturing process, and the most part of equipment investment. The entire process requires a high level of purification (e.g., level 10).
