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The BBI-12864-000298H is a 128X64 DOTS MATRIX LCD module, which is fabricated by low power COMS technology. It has an STN panel composed of 128 segments and 64 commons. The LCM can be easily accessed by microcontroller serial.
Display Mode | Transflective |
STN,GREEN,Negative,transmissive | |
Display Format | 128X64 DOTS MATRIX |
Input Data | parallel |
Multiplexing Ration | 1/65Duty , 1/9Bias |
Viewing Direction | 6 O’clock |
Driver | ST7565R |
Interface Type | Parallel interface,8080 series |
BACKLIGHT | White LED |
Item | Specifications | Unit |
Module Size(W*H*T) | 93.7X53.0X5.50 | mm |
Viewing Area (W*H) | 70.7X38.8 | mm |
Dot Pitch (W*H) | 0.52X0.52 | mm |
Dot Size (W*H) | 0.48X0.48 | mm |
Active Area (W*H) | 66.52X33.24 | mm |
Number of Dots | 128X64 | --- |
Application：
VA LCD PANEL Application：Automotive ，Medical。
TN LCD PANEL Application：Automotive ，Medical，Thermometer。
STN LCD PANEL Application：Electric Meter ，Elevator，Home appliance
Consumer Electronics，Watch。
BIGBOOK Factory：
****************************************************************************************************
TFT LCD Modules Use Matters Needing Attention:
TFT LCD modules(TFT LCD panel) use matters needing attention:
1, when using the TFT LCD module design products, pay attention to the angle of the LCD product use is consistent with the design.
2, the prevention of damage LCD glass, dropped or hit with a hard object will cause the LCD is cracked or shattered. Especially at the corners.
3 inhibition, LCD polarizer reflective surfaces, being careful not to scratch the surface, featured on the TFT LCD screen surface is made of transparent plastic material protection.
4, if the LCD module storage below the below the set temperature, liquid crystal material condenses and performance deterioration. If LCD modules stored in the above required temperature, liquid crystal molecular orientation can be transformed into liquid, it may not be restored to its original state. Beyond the range of temperature and humidity, it will cause the polarizer peeling or blistering. Therefore, LCD modules should be stored at a specified temperature range.
5.The fabrication process of a-Si TFT is to first sputter the gate material film on the borosilicate glass substrate, and then form the grid pattern after the mask exposure, the development and the dry etching. Step exposure machine for general mask exposure. The second step is to use PECVD method for continuous film formation, SiNx film, non doped a-Si film, phosphorus doped n+a-Si film. Then, the a-Si pattern of the TFT part is formed by mask exposure and dry etching. The third step is to form a transparent electrode (ITO film) by sputtering, and then to display the electrode pattern by mask exposure and wet etching. The contact hole pattern of the fourth step gate extreme insulation film is formed by mask exposure and dry etching method. The fifth step is to sputter AL into the film, with mask exposure, etching the source, drain and signal line pattern of TFT. Finally, the protective film is formed by PECVD method, and then the film is etched by mask exposure and dry etching. The protective film is used to protect the electrode and the electrode and the display electrode. So far, the whole process is completed.
TFT array technology is the key of TFT-LCD manufacturing process, and the most part of equipment investment. The entire process requires a high level of purification (e.g., level 10).
The BBI-12864-000298H is a 128X64 DOTS MATRIX LCD module, which is fabricated by low power COMS technology. It has an STN panel composed of 128 segments and 64 commons. The LCM can be easily accessed by microcontroller serial.
Display Mode | Transflective |
STN,GREEN,Negative,transmissive | |
Display Format | 128X64 DOTS MATRIX |
Input Data | parallel |
Multiplexing Ration | 1/65Duty , 1/9Bias |
Viewing Direction | 6 O’clock |
Driver | ST7565R |
Interface Type | Parallel interface,8080 series |
BACKLIGHT | White LED |
Item | Specifications | Unit |
Module Size(W*H*T) | 93.7X53.0X5.50 | mm |
Viewing Area (W*H) | 70.7X38.8 | mm |
Dot Pitch (W*H) | 0.52X0.52 | mm |
Dot Size (W*H) | 0.48X0.48 | mm |
Active Area (W*H) | 66.52X33.24 | mm |
Number of Dots | 128X64 | --- |
Application：
VA LCD PANEL Application：Automotive ，Medical。
TN LCD PANEL Application：Automotive ，Medical，Thermometer。
STN LCD PANEL Application：Electric Meter ，Elevator，Home appliance
Consumer Electronics，Watch。
BIGBOOK Factory：
****************************************************************************************************
TFT LCD Modules Use Matters Needing Attention:
TFT LCD modules(TFT LCD panel) use matters needing attention:
1, when using the TFT LCD module design products, pay attention to the angle of the LCD product use is consistent with the design.
2, the prevention of damage LCD glass, dropped or hit with a hard object will cause the LCD is cracked or shattered. Especially at the corners.
3 inhibition, LCD polarizer reflective surfaces, being careful not to scratch the surface, featured on the TFT LCD screen surface is made of transparent plastic material protection.
4, if the LCD module storage below the below the set temperature, liquid crystal material condenses and performance deterioration. If LCD modules stored in the above required temperature, liquid crystal molecular orientation can be transformed into liquid, it may not be restored to its original state. Beyond the range of temperature and humidity, it will cause the polarizer peeling or blistering. Therefore, LCD modules should be stored at a specified temperature range.
5.The fabrication process of a-Si TFT is to first sputter the gate material film on the borosilicate glass substrate, and then form the grid pattern after the mask exposure, the development and the dry etching. Step exposure machine for general mask exposure. The second step is to use PECVD method for continuous film formation, SiNx film, non doped a-Si film, phosphorus doped n+a-Si film. Then, the a-Si pattern of the TFT part is formed by mask exposure and dry etching. The third step is to form a transparent electrode (ITO film) by sputtering, and then to display the electrode pattern by mask exposure and wet etching. The contact hole pattern of the fourth step gate extreme insulation film is formed by mask exposure and dry etching method. The fifth step is to sputter AL into the film, with mask exposure, etching the source, drain and signal line pattern of TFT. Finally, the protective film is formed by PECVD method, and then the film is etched by mask exposure and dry etching. The protective film is used to protect the electrode and the electrode and the display electrode. So far, the whole process is completed.
TFT array technology is the key of TFT-LCD manufacturing process, and the most part of equipment investment. The entire process requires a high level of purification (e.g., level 10).
